3D Magnetron Sputtering PVD Coating System For SEM Sample Preparation

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3D Magnetron Sputtering PVD Coating System For SEM Sample Preparation

Customization:	Available
Warranty:	1 Year
Type:	Coating Production Line

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Product Description

★Product Overview

3D Magnetron Sputtering PVD Coating System For SEM Sample Preparation

Model: ZK-JS04-DC Ion Sputtering Coater

ℹBasic Information

Coating

Vacuum Coating

Substrate

Other

Certification

CE, ISO, RoHS

Condition

New

MOQ

1 Set

Voltage

110V/220V

Transportation

Sea; Express etc

Trade Term

EXW; FOB; DDP; DAP etc

Transport Package

Wood Packing

Specification

Customized

Origin

China

⚙Technical Specifications

Parameter	Specification
Target Materials	Standard: Au (Gold), 57mm diameter × 0.1mm thick Optional: Pt (Platinum)
Standard Sample Holder	Holds 12 SEM stubs, height adjustment range: 60mm
Rotating/Tilting Stage (Optional)	Rotation: 0-60 rpm (adjustable); Tilt: -90° to +90° (adjustable) Platform: 40mm diameter (holds 4 sample holders)
Sputtering Current	5-30mA (microprocessor-controlled, programmable)
Meters	Vacuum: Atm - 1×10-3 mbar; Current: 0-99mA
Control Method	Microprocessor with Start/Pause; Programmable time (1-999s); Auto-pumping/venting
Vacuum System	Pumping speed: 133 L/min; Ultimate vacuum: 10-4 mbar; Noise: 56 dB

✔Key Features & Applications

1. Precision and Flexibility

Adjustable sputtering current and optional rotating/tilting stage enable uniform thin-film deposition for diverse sample geometries. Dual locking mechanism ensures stability.

2. High-Quality Coating

Gold (Au) and Platinum (Pt) targets ensure high-purity conductive coatings essential for high-resolution SEM and analytical applications.

3. Automated Operation

Programmable controls and auto-venting enhance efficiency and safety, making it ideal for busy laboratory environments.

4. Compact Design

Features a stainless steel chamber with a large observation window and a low-noise design (56 dB) for a comfortable working environment.

Ideal Applications: SEM sample preparation, thin-film deposition research, multi-sample processing (up to 12 stubs), and angle-dependent deposition.

📜Certifications

?Frequently Asked Questions

Q1: What is the primary use of this sputtering system?

It is primarily designed for SEM sample preparation to create conductive coatings, as well as thin-film deposition for research and industrial applications.

Q2: Which target materials can be used with this coater?

The system comes standard with a Gold (Au) target. Platinum (Pt) targets are also available as an optional choice for specific analytical needs.

Q3: How many samples can be processed simultaneously?

The standard sample holder is designed to accommodate up to 12 SEM stubs at once, allowing for efficient multi-sample processing.

Q4: Is the sputtering process automated?

Yes, the system features microprocessor-controlled automation for pumping, sputtering, and venting, with programmable time settings from 1 to 999 seconds.

Q5: Can I adjust the angle of deposition?

Yes, with the optional rotating and tilting stage, you can adjust the tilt from -90° to +90° and the rotation from 0-60 rpm for uniform coating on complex geometries.

Q6: What is the noise level during operation?

The system is designed for a laboratory environment with a low noise level of approximately 56 dB, ensuring a comfortable workspace.