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Home > Sample Preparation Systems > Desktop Cold Magnetron Sputtering  Metal System For Conductive Coating Of SEM Sample Preparation
Desktop Cold Magnetron Sputtering  Metal System For Conductive Coating Of SEM Sample Preparation
Desktop Cold Magnetron Sputtering  Metal System For Conductive Coating Of SEM Sample Preparation
Desktop Cold Magnetron Sputtering  Metal System For Conductive Coating Of SEM Sample Preparation
Desktop Cold Magnetron Sputtering  Metal System For Conductive Coating Of SEM Sample Preparation
Desktop Cold Magnetron Sputtering  Metal System For Conductive Coating Of SEM Sample Preparation
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Desktop Cold Magnetron Sputtering  Metal System For Conductive Coating Of SEM Sample Preparation
Desktop Cold Magnetron Sputtering  Metal System For Conductive Coating Of SEM Sample Preparation
Desktop Cold Magnetron Sputtering  Metal System For Conductive Coating Of SEM Sample Preparation
Desktop Cold Magnetron Sputtering  Metal System For Conductive Coating Of SEM Sample Preparation
Desktop Cold Magnetron Sputtering  Metal System For Conductive Coating Of SEM Sample Preparation

Desktop Cold Magnetron Sputtering  Metal System For Conductive Coating Of SEM Sample Preparation

Customization: Available
Warranty: 1 Year
Type: Coating Production Line
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Product Description

Desktop Cold Magnetron Sputtering System

Desktop Cold Magnetron Sputtering Deposition System For Conductive Coating Of SEM Sample Preparation

Model: JY-JS02 - Cold Magnetron Sputtering Deposition System

Basic Information
Coating
Vacuum Coating
Substrate
Other
Certification
CE, ISO, RoHS
Condition
New
MOQ
1
Voltage
110V/220V
Transportation
Sea; Express etc
Trade Term
EXW; FOB; DDP; DAP etc
Transport Package
Wood Packing
Specification
Customized
Origin
China

Product Description

The JY-JS02 is a benchtop cold magnetron sputtering coating system equipped with a standard rotating/tilting sample stage. It is specifically designed for high-quality conductive coating of non-conductive samples with varied surface morphologies for SEM imaging. It also meets the requirements for electrode coating, semiconductor materials, and other thin-film applications.

Key Features
1
"Ultra-Cold" Sputtering: Utilizes a high-efficiency, low-voltage DC magnetron source to prevent thermal damage to sensitive samples.
2
Wide-Angle Coverage: Innovative magnetron design ensures uniform coating coverage, even for closely positioned samples.
3
Fast Operation: Independent solenoid valves for venting, purging, and exhaust enable rapid system cycling.
4
Stable Coating Performance: Precisely controlled sputtering current ensures consistent deposition rates and optimal coating quality.
5
Multi-Material Compatibility: Supports various metal targets (Pt standard, optional Au, Au/Pd, or Pt/Pd) with quick target replacement.

Technical Specifications

Sputtering System
Parameter Specification
Target MaterialStandard: Pt (57mm diameter × 0.1mm thickness); Optional: Au, Au/Pd, Pt/Pd
Sample Stage Rotation0-60 rpm (continuously adjustable)
Sample Stage Tilt-45° to +45° (continuously adjustable)
Stage Diameter40mm (holds 4 standard sample holders; custom sizes available)
Sputtering CurrentMicroprocessor-controlled (0-99 mA) with safety interlock
Vacuum RangeAtm ~3 Pa
Control MethodProgrammable (1-999s) with Start/Pause buttons; automatic pumping/sputtering/venting
Vacuum Pump
Parameter Specification
Pumping Speed133 L/min
Ultimate Vacuum0.05 Pa
Noise Level56 dB

Applications & Advantages

Ideal for SEM Sample Preparation: Ensures high-conductivity coatings without thermal damage.
Versatile Material Deposition: Suitable for Pt, Au, and alloy coatings in nanotechnology and materials research.
User-Friendly Operation: Automated processes and ergonomic design enhance efficiency.
Compact & Reliable: Benchtop design saves lab space while delivering professional-grade performance.

Certifications

Certification 1 Certification 2 Certification 3 Certification 4 Certification 5

Frequently Asked Questions

What is the primary application of this sputtering system?
The system is primarily used for high-quality conductive coating of non-conductive samples for SEM (Scanning Electron Microscopy) imaging, as well as electrode coating and thin-film applications.
How does "Ultra-Cold" sputtering protect my samples?
It uses a high-efficiency, low-voltage DC magnetron source which minimizes heat generation during the sputtering process, preventing thermal damage to delicate or heat-sensitive samples.
Can I use different target materials?
Yes, while Platinum (Pt) is standard, the system is compatible with Gold (Au), Gold/Palladium (Au/Pd), and Platinum/Palladium (Pt/Pd) targets.
Is the sample stage adjustable?
Absolutely. The sample stage features continuous rotation (0-60 rpm) and tilting (-45° to +45°) to ensure uniform coating coverage across varied surface morphologies.
What are the vacuum capabilities of the included pump?
The vacuum pump provides a pumping speed of 133 L/min and can reach an ultimate vacuum of 0.05 Pa, ensuring a clean environment for high-quality deposition.
How is the sputtering process controlled?
The system is microprocessor-controlled and fully programmable (1-999s). It features automated pumping, sputtering, and venting cycles for consistent results.

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